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논문 기본정보
Growth and Properties of CrNx/TiNy/Al Based on N2 Gas Flow Rate for Solar Thermal Applications
논문 개요
| 기관명 | NDSL |
|---|---|
| 저널명 | Transactions on electrical and electronic materials |
| ISSN | 1229-7607, |
| ISBN |
논문저자 및 소속기관 정보
| 저자(한글) | Ju, Sang-Jun,Jang, Gun-Eik,Jang, Yeo-Won,Kim, Hyun-Hoo,Lee, Cheon |
|---|---|
| 저자(영문) | |
| 소속기관 | |
| 소속기관(영문) | |
| 출판인 | |
| 간행물 번호 | |
| 발행연도 | 2016-01-01 |
| 초록 | The CrN/TiN/Al thin films for solar selective absorber were prepared by dc reactive magnetron sputtering with multi targets. The binary nitride CrN layer deposited with change in N 2 gas flow rates. The gas mixture of Ar and N2 was an important parameter during sputtering deposition because the metal volume fraction (MVF) was controlled by the N2 gas flow rate. In this study, the crystallinity and surface properties of the CrN/TiN/Al thin films were estimated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM). The composition and depth profile of thin films were investigated using Auger electron spectroscopy (AES). The absorptance and reflectance with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 300~1,100 nm. |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201620240628851 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
|---|---|
| ICT 기술분류 | |
| DDC 분류 | |
| 주제어 (키워드) | Solar selective absorber,DC magnetron sputtering,Binary nitrides,Multi-layer,Absorptance |