| 저자(한글) |
Verma, A.,Srivastav, A.,Sharma, D.,Banerjee, A.,Sharma, S.,Satsangi, V.R.,Shrivastav, R.,Avasthi, D.K.,Dass, S. |
| 초록 |
Nanostructured TiO 2 thin films were deposited on indium tin oxide (ITO) substrate via sol-gel technique and were modified by plasmonic Au layer. The plasmonic Au modified TiO 2 (Au/TiO 2 ) thin films were then irradiated with 500keV Ar 2+ ion beam at different ion fluences viz. 1x10 16 , 3x10 16 and 1x10 17 to study the effect of nuclear energy deposition on the morphology, crystallinity, band gap, surface plasmon resonance (SPR) peak exhibited by Au particles and photoelectrochemical properties of the system. Prepared thin films were characterized by X-ray diffractometry (XRD), scanning electron microscopy (SEM), Rutherford backscattering spectrometry (RBS) measurements and UV-visible spectroscopy. The photoelectrochemical measurements revealed that both Au/TiO 2 and Au/TiO 2 thin film irradiated at 1x10 16 fluence exhibits enhanced photoelectrochemical response in comparison to pristine TiO 2 . The film irradiated at 1x10 16 fluence offered maximum applied bias photon-to-current efficiency (ABPE) and shows 6 times increment in photocurrent density which was attributed to more negative flat band potential, maximum decrease in band gap, high open circuit voltage (V oc ) and reduced charge transfer resistance. |
