희생층을 이용한 은 나노와이어 패터닝 공정 개발
기관명 | NDSL |
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저널명 | 전기전자재료학회논문지 = Journal of the Korean institute of electronic material engineers |
ISSN | 1226-7945, |
ISBN |
저자(한글) | 하본희,조성진 |
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저자(영문) | |
소속기관 | |
소속기관(영문) | |
출판인 | |
간행물 번호 | |
발행연도 | 2016-01-01 |
초록 | We developed a Ag nanowire patterning technique using a water-soluble sacrificial layer. To form a water-soluble sacrificial layer, germanium was deposited on the substrate and then water-soluble germanium oxide was simply formed by thermal oxidation of germanium using a conventional furnace. The formation of Ag nanowire patterns with various line and space arrangements was successfully demonstrated using this patterning process. The main advantage of this patterning technique is that it does not use a strong acid etchant, thereby preventing damage to the Ag nanowire during the patterning process. |
원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201622341962170 |
첨부파일 |
과학기술표준분류 | |
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ICT 기술분류 | |
DDC 분류 | |
주제어 (키워드) | Ag nanowire,Sacrificial layer,Germanium oxide,SU-8 |