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특허/실용신안
MASK BLANK, METHOD OF MANUFACTURING IMPRINT MOLD, METHOD OF MANUFACTURING TRANSFER MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
특허 실용신안 개요
| 기관명 | NDSL |
|---|---|
| 출원인 | HOYA CORPORATION |
| 출원번호 | 18226165 |
| 출원일자 | 2023-07-25 |
| 공개번호 | 20231116 |
| 공개일자 | 0000-00-00 |
| 등록번호 | |
| 등록일자 | 0000-00-00 |
| 권리구분 | USAP |
| 초록 | A light shielding film made up of a material containing one or more elements selected from silicon and tantalum and a hard mask film made up of a material containing chromium, oxygen, and carbon are laminated on a transparent substrate. The hard mask film is a single layer film having a composition gradient portion with increased oxygen content on the surface and on the neighboring region. The maximum peak for N1s in a narrow spectrum obtained via X-ray photoelectron spectroscopy analysis is the lower limit of detection or less. The portions excluding the composition gradient portion of the hard mask film have a 50 atom% or more chromium content, and the maximum peak for Cr2p in a narrow spectrum obtained via X-ray photoelectron spectroscopy analysis has a binding energy of 574 eV or less. |
| 원문URL | http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=USAP&cn=USA2023110367196 |
| 첨부파일 |
추가정보
| 과학기술표준분류 | |
|---|---|
| ICT 기술분류 | |
| IPC분류체계CODE | G03F-001/24(2012.01),H01L-021/033(2006.01) |
| 주제어 (키워드) |