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특허/실용신안

METHODS AND COMPOSITIONS FOR MINIMIZING X-RAY SCATTERING ARTIFACTS

특허 실용신안 개요

기관명, 출원인, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 권리구분, 초록, 원본url, 첨부파일 순으로 구성된 표입니다.
기관명 NDSL
출원인 Scheiffele, Gary W.
출원번호 18301677
출원일자 2023-04-17
공개번호 20230810
공개일자 0000-00-00
등록번호
등록일자 0000-00-00
권리구분 USAP
초록 Disclosed are methods for minimizing x-ray scattering artifacts, the method comprising: contacting an object with an x-ray scattering mitigation material. The contacting can comprise coating the x-ray scattering material on the object, including spraying a solution of suspension of an x-ray scattering mitigation material onto the object or dry powder coating the object with a x-ray scattering mitigation material. Alternatively, the contacting can comprise immersing the object in a fluid comprising the x-ray scattering material. The fluid can be a gas, a liquid, or a gel. The disclosed x-ray scattering mitigation material can be optimized for mitigating Compton radiation scattering or for mitigating Rayleigh radiation scattering. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
원문URL http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=USAP&cn=USA2023080253130
첨부파일

추가정보

과학기술표준분류, ICT 기술분류, IPC분류체계CODE, 주제어 (키워드) 순으로 구성된 표입니다.
과학기술표준분류
ICT 기술분류
IPC분류체계CODE G21K-001/10(2006.01),C09D-001/00(2006.01),C09D-005/03(2006.01),C09D-005/32(2006.01),B05D-001/12(2006
주제어 (키워드)