| 초록 |
An X-ray metal grating structure manufacturing method of the present invention includes: in a metal substrate having a patterned resist layer on a principal surface thereof, forming a plurality of pores in a portion of the metal substrate corresponding to a removed portion of the resist layer, by an anodic oxidation process, and removing the portion formed with the plurality of pores to form a recess. An X-ray imaging device of the present invention includes the X-ray metal grating structure manufactured by the X-ray metal grating structure manufacturing method. |
